Browsing by Author "Kim, Tae-Gon"

Acidic cleaning solutions for post InGaAs CMP cleaning

Acoustic cleaning in nano-electronics

Analyzing the collapse force determined using lateral force AFM using

Analyzing the collapse force determined using lateral force AFM using mechanics theory

Analyzing the collapse force of narrow lines measured by lateral force AFM using an analytical mechanical model

Atomic resolution quality control for Fin oxide recess by atomic resolution profiler

Challenges and novel approaches for photo resist removal and post-etch residue removal for 22 nm interconnects

Characterization of low-k dielectric etch residue on the sidewall by chemical force microscope

Characterization of metal permeation in porous low-k films by spectroscopic ellipsometry

Collapse behavior and forces of multistack nanolines

Collapse behavior and forces of multistack patterns

Development of post InGaAs CMP cleaning process for sub 10 nm device application

Development of post InGaAs CMP cleaning process for sub 10nm device application

Effect of ammonium halide salts on wet chemical nanoscale etching and polishing of InGaAs surfaces for advanced CMOS devices

Effects of H2O2 and pH on the Chemical Mechanical Planarization of Molybdenum

Effects of interfacial strength and dimension of structures on physical cleaning window

Estimation of the adhesion strength of particles/residues and gate structures for calculating the damage threshold of patterned silicon wafers during physical force assisted cleans

From confined area to wafer level nanotopography metrology solution for process developments

In-line 3D AFM for critical dimension and sidewall roughness of Si photonic waveguide and correlation with its propagation loss

In-line atomic resolution local nanotopography variation metrology for CMP process