Browsing by Author "Kluth, J."
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Publication Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications
Journal article2004, Journal of the Electrochemical Society, (151) 10, p.F228-F234Publication Issues, achievements and challenges towards intergration of high-k dielectrics
Proceedings paper2002, 5th International Forum on Semiconductor Technology - IFST, 21/02/2002Publication Physical characterisation of high-gate stacks
Oral presentation2002, MRS Fall Meeting Symposium N: Novel Materials and Processes for Advanced CMOSPublication Scalability of MOCVD-deposited Hafnium oxide
; ; ; ; Proceedings paper2003, CMOS Front-End Materials and Process Technology, 21/04/2003, p.59-64