Browsing by Author "Knaepen, W."
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Publication 0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications
Proceedings paper2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.929-632Publication Atomic layer deposition of hafnium titanates dielectric layers
Proceedings paper2008, 8th International Conference on Atomic Layer Deposition - ALD, 29/06/2008Publication Elucidation of the mechanism in fluorine-free prepared YBa2Cu3O7-delta coatings
;Vermeir, P. ;Cardinael, I. ;Schaubroeck, J. ;Verbeken, K. ;Backer, M. ;Lommens, P.Knaepen, W.Journal article2010, Inorganic Chemistry, (49) 10, p.4471-4477Publication Formation and texture of palladium germanides studied by in situ x-ray diffraction and pole figure measurements
Journal article2014, Thin Solid Films, 551, p.86-91Publication High-k dielectrics and metal gates for future generation memory devices
;Kittl, Jorge; ; ;Menou, Nicolas; Wang, Xin PengMeeting abstract2009, 215th ECS Meeting, 24/05/2009, p.690Publication High-k dielectrics and metal gates for future generation memory devices
;Kittl, Jorge; ; ;Menou, Nicolas; Wang, Xin PengProceedings paper2009, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS. 5: New Materials, Processing, and Equipment, 24/05/2009, p.29-40Publication High-k dielectrics for future generation memory devices
;Kittl, Jorge; ; ;Menou, Nicolas; Wang, Xin PengJournal article2009, Microelectronic Engineering, (86) 7_9, p.1789-1795