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Browsing by Author "Knaepen, W."

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    0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications

    Menou, Nicolas
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    Wang, Xin Peng
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    Kaczer, Ben  
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    Polspoel, Wouter
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    Popovici, Mihaela Ioana  
    Proceedings paper
    2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.929-632
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    Atomic layer deposition of hafnium titanates dielectric layers

    Popovici, Mihaela Ioana  
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    Delabie, Annelies  
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    Van Elshocht, Sven  
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    Menou, Nicolas
    ;
    Wang, Xin Peng
    Proceedings paper
    2008, 8th International Conference on Atomic Layer Deposition - ALD, 29/06/2008
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    Elucidation of the mechanism in fluorine-free prepared YBa2Cu3O7-delta coatings

    Vermeir, P.
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    Cardinael, I.
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    Schaubroeck, J.
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    Verbeken, K.
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    Backer, M.
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    Lommens, P.
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    Knaepen, W.
    Journal article
    2010, Inorganic Chemistry, (49) 10, p.4471-4477
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    Formation and texture of palladium germanides studied by in situ x-ray diffraction and pole figure measurements

    Geenen, F.
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    Knaepen, W.
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    De Keyser, K.
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    Opsomer, Karl  
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    Vanmeirhaeghe, R.L.
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    Jordan-Sweet, J.
    Journal article
    2014, Thin Solid Films, 551, p.86-91
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    High-k dielectrics and metal gates for future generation memory devices

    Kittl, Jorge
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    Opsomer, Karl  
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    Popovici, Mihaela Ioana  
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    Menou, Nicolas
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    Kaczer, Ben  
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    Wang, Xin Peng
    Meeting abstract
    2009, 215th ECS Meeting, 24/05/2009, p.690
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    High-k dielectrics and metal gates for future generation memory devices

    Kittl, Jorge
    ;
    Opsomer, Karl  
    ;
    Popovici, Mihaela Ioana  
    ;
    Menou, Nicolas
    ;
    Kaczer, Ben  
    ;
    Wang, Xin Peng
    Proceedings paper
    2009, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS. 5: New Materials, Processing, and Equipment, 24/05/2009, p.29-40
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    High-k dielectrics for future generation memory devices

    Kittl, Jorge
    ;
    Opsomer, Karl  
    ;
    Popovici, Mihaela Ioana  
    ;
    Menou, Nicolas
    ;
    Kaczer, Ben  
    ;
    Wang, Xin Peng
    Journal article
    2009, Microelectronic Engineering, (86) 7_9, p.1789-1795

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