Browsing by Author "Kusnadi, Ir"
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Publication Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 041603Publication Contour-based self-aligning calibration of OPC models
Proceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382MPublication Contour-quality assessment for OPC model calibration
Proceedings paper2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72722QPublication High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Publication High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Publication High-precision contouring from SEM image in 32-nm lithography and beyond