Browsing by Author "Libeert, Guillaume"
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Publication Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33
Proceedings paper2025, Photomask Technology, 2025-09-22, p.1368711Publication An experimental stitching study on the eve of High NA EUV
Proceedings paper2024-02-26, Optical and EUV Nanolithography XXXVII, 2024-02-26, p.129530JPublication Au-3-Decorated graphene as a sensing platform for O-2 adsorption and desorption kinetics
Publication Depth-of-Focus enhancement in High-Numerical Aperture EUV lithography by source and mask optimization
Proceedings paper2025, PHOTOMASK TECHNOLOGY 2025, 2025-09-22, p.136870PPublication High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print
Proceedings paper2025, Photomask Technology, 2025-09-22, p.1368713Publication Magnetic clusters as efficient EY-like spin-scattering centres in graphene
Journal article2024, NANOSCALE, (16) 33, p.15713-15721Publication Mask innovations on the eve of high NA EUV lithography
Journal article review2024, JAPANESE JOURNAL OF APPLIED PHYSICS, (63) 4, p.Art. 040804Publication Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study
Journal article2025, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (24) 1, p.011012Publication Tuning the spintronic properties of graphene with atomically precise Au clusters