Browsing by Author "Loewenstein, Lee"
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Publication Advanced cleaning for the growth of ultrathin gate oxide
Journal article1999, Microelectronic Engineering, (48) 1_4, p.199-206Publication Advanced cleaning strategies for ultra-clean silicon surfaces
; ; ; Publication Advances in understanding wet cleaning technology and the effect of metal contamination
; ; ; Publication Behaviour of metallic contaminants during MOS processing
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.11-14Publication Behaviour of metallic contaminants during MOS processing
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Chemistry of the silicon oxide surface: adsorption from SC1 solutions
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Chemistry of the silicon oxide surface: adsorption from SC1 solutions
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.53-58Publication Competititive adsorption of cations onto the silicon surface: the role of the ammonium ion in ammonia-peroxide solution
Publication Competitive adsorption of cations onto the silicon surface: the role of ammonium ion in APM
Publication Competitive adsorption of metal ions onto hydrophilic silicon surfaces from aqueous solutions
Journal article1999, J. Electrochem. Soc., (146) 2, p.719-727Publication Cost-effective cleaning and high-quality thin gate oxides
Journal article1999, IBM Journal of Research and Development, (43) 3, p.339-350Publication Cost-effective cleaning for advanced Si-processing
; ; ; Publication Developments in cleaning technology for critical layers
Oral presentation2000, Santa Clara Plastics Symposium on Cleaning Technology; May 2000Publication DI water purity concerns for post-clean rinsing
Publication Distribution of metal contamination in SiO2/Si systems
Meeting abstract1999, Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 17/10/1999, p.1107Publication Effect of metal contamination and improved cleaning strategies
Proceedings paper1999, Defects in Silicon III, 2/05/1999, p.401-413Publication Effect of metal contamination and improved cleaning strategies
Proceedings paper1999, 6th International SCP Symposium "Meeting the Surface Preparation Challenges of the New Millennium", 10/05/1999Publication Efficiency of ozonated DI water in removing organic contamination
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.247-255