Browsing by Author "Maekawa, K."
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Publication A novel low temperature etch approach to reduce ULK plasma damage
Meeting abstract2015, Plasma Etch and Strip in Microtechnology - PESM, 27/04/2015Publication A Novel Volatile Film for Dielectric Plasma Damage Protection
Meeting abstract2019, Plasma Etch and Strip in Microtechnology Workshop - PESM, 20/05/2019Publication Cryogenic etching of porous organosilicate low-k materials: reduction of plasma induced damage
Meeting abstract2015, AVS 62nd International Symposium & Exhibition, 19/10/2015, p.124Publication Low-k cryo-etching : comparison of four different High Boiling Point Organic (HBPO)
;Chanson, Romain ;Lefaucheux, P.L. ;Dussart, R. ;Tillocher, T. ;Shen, P. ;Urabe, K.Dussarat, C.Meeting abstract2017, AVS 64th International Symposium & Exhibition, 28/10/2017, p.EM-ThP5Publication Plasma cryoetching processes for silicon and advanced materials
;Dussart, R. ;Tillocher, T. ;Gosset, N. ;Vital, A ;Lefaucheux, P. ;L'jazouli, RBoufnichel, M.Meeting abstract2014, International Conference on Microelectronics and Plasma Technology - ICMAP, 8/07/2014Publication Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process
Proceedings paper2015, 22nd International Symposium on Plasma Chemistry - ISPC, 5/07/2015, p.O-8-1