Browsing by Author "Maes, J.W."
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Publication Alternative high-k dielectrics for semiconductor applications
Oral presentation2008, 15th Workshop on Dielectrics in Microelectronics - WODIMPublication Buried Power Rail Metal exploration towards the 1 nm Node
Proceedings paper2021, IEEE International Electron Devices Meeting (IEDM), DEC 11-16, 2021Publication Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods
; ; ; ; Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies
Proceedings paper2003, CMOS Front-End Materials and Process Technology, 21/04/2003, p.47-58Publication Phosphorus doped SiC source drain and SiGe channel for scaled bulk FinFETs
Proceedings paper2012, International Electron Devices Meeting - IEDM, 10/12/2012, p.18.2Publication Plasma modification of Hf based high-k dielectrics: effect of nitridation and silicon nitride deposition
Proceedings paper2004, Physics and Technology of High-k Gate Dielectrics II, 12/10/2003, p.37-46Publication Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey
Journal article2005-01, Microelectronics Reliability, (45) 5_6, p.786-789Publication Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey
Proceedings paper2004, 13th Workshop on Dielectrics in Microelectronics - WODIM, 28/06/2004