Browsing by Author "Mangat, Pawitter"
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Publication A method of image-based aberration metrology for EUVL tools
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 23/02/2015, p.942215Publication Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94220IPublication Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Journal article2014, Journal of Vacuum Science and Technology B, (32) 6, p.06F801Publication Imaging impact of multilayer tuning in EUV masks, experimental validation
Proceedings paper2014, Photomask Technology 2014, BACUS, 16/09/2014, p.92350JPublication Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography, 21/02/2016, p.977619Publication Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Oral presentation2014, International Symposium on EUVL