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Browsing by Author "Mangat, Pawitter"

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    A method of image-based aberration metrology for EUVL tools

    Levinson, Zac
    ;
    Raghunathan, Sudhar
    ;
    Verduijn, Erik  
    ;
    Wood, Obert
    ;
    Mangat, Pawitter
    Proceedings paper
    2015, Extreme Ultraviolet (EUV) Lithography VI, 23/02/2015, p.942215
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    Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

    Wood, Obert
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    Raghunathan, Sudhar
    ;
    Mangat, Pawitter
    ;
    Philipsen, Vicky  
    ;
    Luong, Vu  
    Proceedings paper
    2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94220I
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    Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

    Raghunathan, Sudhar
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    Wood, Obert
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    Mangat, Pawitter
    ;
    Verduijn, Erik  
    ;
    Philipsen, Vicky  
    Journal article
    2014, Journal of Vacuum Science and Technology B, (32) 6, p.06F801
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    Imaging impact of multilayer tuning in EUV masks, experimental validation

    Philipsen, Vicky  
    ;
    Hendrickx, Eric  
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    Verduijn, Erik  
    ;
    Raghunathan, Sudhar
    ;
    Wood, Obert
    Proceedings paper
    2014, Photomask Technology 2014, BACUS, 16/09/2014, p.92350J
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    Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

    Wood, Obert
    ;
    Wong, Keith
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    Parks, Valentin
    ;
    Kearney, Patrick
    ;
    Meyer-Ilse, Julia
    ;
    Luong, Vu  
    Proceedings paper
    2016, Extreme Ultraviolet (EUV) Lithography, 21/02/2016, p.977619
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    Improving EUV imaging at tighter pitch using a tuned-ML mask stack

    Wood, Obert
    ;
    Philipsen, Vicky  
    ;
    Soltwisch, Victor
    ;
    Raghunathan, Sudhar
    ;
    Verduijn, Erik  
    Oral presentation
    2014, International Symposium on EUVL

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