Browsing by Author "Mankelevich, Yuri"
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Publication Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
Journal article2020, MATERIALS ADVANCES, (1) 8, p.3049-3057Publication Damage free cryogenic etching of porous organosilica ultralow-k film
Meeting abstract2012, AVS 59th Annual International Symposium and Exhibition, 28/10/2012Publication Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4
Journal article2013, ECS Journal of Solid State Science and Technology, (2) 6, p.N131-N139Publication Reactive plasma cleaning and restoration of transition metal dichalcogenide monolayers
Journal article2021, NPJ 2D MATERIALS AND APPLICATIONS, (5) 1, p.17Publication Recombination of O and H atoms on the surface of nanoporous dielectrics
Publication Surface-confined activation of ultra low-k dielectrics in CO2 plasma
Journal article2016, Applied Physics Letters, (108) 26, p.262902