Browsing by Author "Marschner, Thomas"
- Results Per Page
- Sort Options
Publication CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
Proceedings paper1998, Optical Microlithography XI, 25/02/1998, p.56-66Publication CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
Proceedings paper1999, Optical Microlithography XII, 14/03/1999, p.228-238Publication EUV mask defect inspection for the 3nm technology node
Proceedings paper2023, 38th European Mask and Lithography Conference (EMLC 2023), 17/06/2023, p.Art. 128020HPublication Exploring capabilities of electrical linewidth measurement (ELM) techniques
Journal article2001, Microelectronic Engineering, (57-58) 1_4, p.673-681Publication Intra-wafer CD-control in state-of-the-art lithography
Proceedings paper1999, Optical Microlithography XII, 14/03/1999, p.882-892Publication Qualification of electrical linewidth measurements (ELM) as a metrology tool for 0.18μm and below
Proceedings paper1998, Proceedings of the Microlithography Symposium. Interface '98, 15/11/1998, p.263-276Publication Reticle imaging and metrology using a CD-SEM at IMEC
Proceedings paper2000, 16th European Conferenc on Mask Technology for Integrated Circuits and Microcomponents, p.128-133Publication Role of LV-SEM reticle CD measurements on DUV lithography
Proceedings paper1999, Metrology, Inspection, and Process Control for Microlithography XIII, 15/03/1999, p.830-837Publication Some challenges for mask making to keep up with the roadmap
Proceedings paper1998, 18th Annual BACUS Symposium on Photomask Technology and Management, 16/09/1998, p.313-324Publication Some challenges for mask making to keep up with the roadmap
Oral presentation1998, 15th European Conference on Mask Making Technology for Integrated Circuits and Micro-Components; 16-17 November 1998; Munchen, GPublication Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system
Publication Variable threshold resist models for lithography simulation
Proceedings paper1999, Optical Microlithography XII, 17/03/1999, p.176-182