Browsing by Author "Maslow, Mark John"
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Publication Impact of local variability on defect-aware process windows
Proceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570HPublication Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
Proceedings paper2019, International conference on Extreme Ultraviolet Lithography, 15/09/2019, p.111470EPublication Spatial frequency breakdown of CD variation
Proceedings paper2022, 37th European Mask and Lithography Conference, 2022-06-20, p.Art. 124720HPublication Understanding the significance of local variability in defect-aware process windows
Journal article2020, IEEE Transactions on Semiconductor Manufacturing, (33) 1, p.42-52