imec Institutional Repository Browsing {{ collection }} by Author "Moguilnikov, Konstantin"

Publication

Determination of critical characteristics of low-k films by ellipsometric porosimetry

Baklanov, Mikhaïl

;

Moguilnikov, Konstantin

Proceedings paper

2002, International SEMATECH Ultra Low-k Workshop, 6/06/2002

Publication

Determination of Young's Modulus of porous low-k films by ellipsometruc porosimetry

Moguilnikov, Konstantin

;

Baklanov, Mikhaïl

Journal article

2002, Electrochemical and Solid-State Letters, (5) 12, p.F29-F31

Publication

Ellipsometric study of the change in the porosity of silica xerogels after chemical modification of the surface with hexamethyldisilazane

Himcinschi, C.

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Friedrich, M.

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Frühauf, S.

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Streiter, I.

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Schulz, S.E.

;

Gessner, T.

Journal article

2002, Analytical and Bioanalytical Chemistry, 374, p.654-657

Publication

Non-destructive characterisation of porous low-k dielectric films

Baklanov, Mikhaïl

;

Moguilnikov, Konstantin

Journal article

2002, Microelectronic Engineering, (64) 1_4, p.335-349

Publication

Porosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: a comparative study

Grill, A.

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Patel, V.

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Rodbell, K.P.

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Huang, E.

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Baklanov, Mikhaïl

;

Moguilnikov, Konstantin

Journal article

2003, Journal of Applied Physics, (94) 5, p.3427-3435

Publication

Properties of mesoporous low-k MSSQ based film prepared using macromolecular porogen

Baklanov, Mikhaïl

;

Jehoul, Christiane

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Flannery, C. M.

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Moguilnikov, Konstantin

;

Gore, R.

Proceedings paper

2002, Advanced Metallization Conference 2001, 9/10/2001, p.273-278

Publication

Structural characterization of mesoporous organosilica films for ultralow-k dielectrics

de Theije, F.K.

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Balkenende, A.R.

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Verheyen, M.A.

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Baklanov, Mikhaïl

;

Moguilnikov, Konstantin

Journal article

2003, Journal of Physical Chemistry B, (107) 18, p.4280-4289

Browsing by Author "Moguilnikov, Konstantin"