Browsing by Author "Montgomery, Patrick"
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Publication Arf solutions for low-k1 back-end imaging
Proceedings paper2003, Optical Microlithography XVI, 23/02/2003, p.270-281Publication Complementary phase-shift mask towards 70-nm technology node
Proceedings paper2002, Optical Microlithography XV, 5/03/2002, p.AddendumPublication High-NA ArF lithography for 70-nm technologies
Proceedings paper2002, Optical Microlithography XV, 5/03/2002, p.1613-1624Publication Mighty hight-t lithography for 65nm generation contacts
Publication Model-based design improvements for the 100nm lithography generation
Publication Process, design and optical proximity correction requirements for the 65nm device generation