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Browsing by Author "Mouche, Laurent"

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    Development of a reduced cleaning process for application in a spray processor

    Snee, Peter
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    Mouche, Laurent
    ;
    Mertens, Paul  
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    Meuris, Marc  
    ;
    Schmidt, Harald
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    Heyns, Marc  
    Proceedings paper
    1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.149-52
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    Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions

    Teerlinck, Ivo
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    Schmidt, Harald
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    Rotondaro, Antonio
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    Hurd, Trace
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    Mouche, Laurent
    ;
    Mertens, Paul  
    Proceedings paper
    1996, Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.284-291
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    Light point defect generation during photoresist spin coating

    Mouche, Laurent
    ;
    Meuris, Marc  
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    Heyns, Marc  
    Journal article
    1997, J. Electrochem. Soc., (144) 10, p.3608-3613
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    Photoresist filtration performance of UPE and PTFE filters

    Mouche, Laurent
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    Meuris, Marc  
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    Heyns, Marc  
    ;
    Zahka, J.
    Proceedings paper
    1996, Proceedings of the Institute of the Environmental Sciences: 42nd Annual Technical Meeting, 12/05/1996, p.259-267
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    Point of use HF purification for Si surface preparation

    Fyen, Wim
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    Mouche, Laurent
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    Meuris, Marc  
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    Heyns, Marc  
    ;
    Zahka, J.
    Proceedings paper
    1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.131-134
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    Point of use HF purification for silicon surface preparation by ion exchange

    Fyen, Wim
    ;
    Mouche, Laurent
    ;
    Meuris, Marc  
    ;
    Heyns, Marc  
    ;
    Zahka, J.
    Journal article
    1997, Journal of the Electrochemical Society, (144) 6, p.2189-2196
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    Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface

    Boullart, Werner  
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    Mannaert, Geert  
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    Graham, S.
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    Tarassenko, C.
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    Mouche, Laurent
    Oral presentation
    1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
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    Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface

    Boullart, Werner  
    ;
    Mannaert, Geert  
    ;
    Graham, S.
    ;
    Tarassenko, C.
    ;
    Mouche, Laurent
    Proceedings paper
    1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.283-286
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    Silicon surface roughening in an iron contaminated SCl bath

    Knotter, D. M.
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    Mouche, Laurent
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    Meuris, Marc  
    ;
    Heyns, Marc  
    Proceedings paper
    1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.103-106
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    Ultra thin gate oxide technology and reliability

    Heyns, Marc  
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    Depas, Michel
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    Teerlinck, Ivo
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    Meuris, Marc  
    ;
    Mertens, Paul  
    ;
    Vanhellemont, Jan
    Proceedings paper
    1996, Proceedings 5th International Symposium on Semiconductor Manufacturing - ISSM, 2/10/1996, p.208-211

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