Browsing by Author "Muramatsu, Makoto"
Now showing 1 - 6 of 6
- Results Per Page
- Sort Options
Publication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Publication EUV resist performance enhancement by UV flood exposure for high NA EUV lithography
Publication Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control
Proceedings paper2014, Alternative Lithographic Technologies VI, 23/02/2014, p.90491LPublication Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
Publication Recent advances in EUV patterning in preparation towards high-NA EUV
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981G