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Browsing by Author "Naem, Abdalla"

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    0.13µm CMOS technology with optimized poly-Si / NO-oxide gate stack

    Kubicek, Stefan  
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    Jansen, Philippe
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    Badenes, Gonçal
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    Schaekers, Marc  
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    Kol'dyaev, Victor
    Proceedings paper
    1999, ULSI Process Integration. Proceedings of the First International Symposium, 17/10/1999, p.193-202
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    Analysis of leakage currents and impact on off-state power consumption for CMOS technology in the 100-nm regime

    Henson, Kirklen
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    Yang, N.
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    Kubicek, Stefan  
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    Vogel, E. M.
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    Wortman, J.
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    De Meyer, Kristin  
    Journal article
    2000, IEEE Trans. Electron Devices, (47) 7, p.1393-1400
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    Closed form inductance calculation for integrated spiral inductor compact modeling

    Jenei, Snezana
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    Nauwelaers, Bart  
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    Decoutere, Stefaan  
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    Naem, Abdalla
    Proceedings paper
    2000, Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems. Digest of Papers, 26/04/2000, p.131-135
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    Effect of implantation oxide on the silicidation of narrow diffused and poly-lines

    Naem, Abdalla
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    Lauwers, A.
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    de Potter de ten Broeck, Muriel  
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    Maex, Karen  
    Oral presentation
    1997, Materials Research Society 1997 Spring Meeting : Symposium on Multilevel Metal Process Integration; April 1-2, 1997; San Francis
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    Effect of implantation oxide on the Ti- and Co-silicidation of narrow diffusion and poly-lines

    Lauwers, Anne  
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    Naem, Abdalla
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    de Potter de ten Broeck, Muriel  
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    Maex, Karen  
    Journal article
    1998, Thin Solid Films, 320, p.122-127
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    Gate stack optimisation for advanced CMOS process

    Kubicek, Stefan  
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    Vandenberghe, Geert  
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    Schaekers, Marc  
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    Kol'dyaev, Victor
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    Jansen, Philippe
    Proceedings paper
    1999, ESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium., p.412-415
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    High density 3-D stack structure for SIP solutions

    Stoukatch, Serguei
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    Ho, Meng
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    Vaesen, Kristof  
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    Webers, Tomas  
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    Carchon, Geert
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    De Raedt, Walter  
    Proceedings paper
    2003, 14th European Microelectronics and Packaging Conference & Exhibition - EMPC, 23/02/2003, p.341-343
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    Influence of device geometry on ESD performance for deep submicron CMOS technology

    Bock, Karlheinz
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    Keppens, Bart
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    De Heyn, Vincent  
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    Groeseneken, Guido  
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    Ching, L. Y.
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    Naem, Abdalla
    Proceedings paper
    1999, Tagungsband 6th ESD-Forum; October 1999; München, Germany., p.83-93
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    Influence of gate length on ESD performance for deep submicron CMOS technology

    Bock, Karlheinz
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    Keppens, Bart
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    De Heyn, Vincent  
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    Groeseneken, Guido  
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    Ching, L. Y.
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    Naem, Abdalla
    Proceedings paper
    1999, Electrical Overstress/Electrostatic Discharge Symposium Proceedings - EOS-ESD, 28/09/1999, p.95-104
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    Influence of gate length on ESD-performance for deep submicron CMOS technology

    Bock, Karlheinz
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    Keppens, Bart
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    De Heyn, Vincent  
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    Groeseneken, Guido  
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    Ching, L. Y.
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    Naem, Abdalla
    Journal article
    2001, Microelectronics Reliability, (41) 3, p.375-383
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    Integrated passives for a DECT VCO

    Vaesen, Kristof  
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    Pieters, Philip  
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    Carchon, Geert
    ;
    De Raedt, Walter  
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    Beyne, Eric  
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    Naem, Abdalla
    Journal article
    2000, IMAPS International Journal of Microcircuits and Electronic Packaging, (23) 3, p.325-331
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    Integrated passives for a DECT VCO

    Vaesen, Kristof  
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    Pieters, Philip  
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    Carchon, Geert
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    De Raedt, Walter  
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    Beyne, Eric  
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    Naem, Abdalla
    Proceedings paper
    2000, Proceedings IMAPS International Conference and Exhibition on High Density Interconnect and Systems Packaging - HDI, 26/04/2000, p.537-541
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    Investigation of instrinsic transistor performance of advanced CMOS devices with 2.5 nm NO gate oxides

    Kubicek, Stefan  
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    Henson, W. K.
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    De Keersgieter, An  
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    Badenes, Gonçal
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    Jansen, Philippe
    Proceedings paper
    1999, International Electron Devices Meeting. Technical Digest; 5-8 Dec. 1999; Washington, D.C., USA., p.823-826
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    Realisation of a DECT VCO circuit with MCM-D technology

    Vaesen, Kristof  
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    Brebels, Steven  
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    De Raedt, Walter  
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    Beyne, Eric  
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    Naem, Abdalla
    ;
    Kohlmann, R.
    Proceedings paper
    1999, ICM'99. The eleventh international conference on microelectronics. Proceedings; 22-24 November 1999; Kuwait., p.141-144
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    Temperature acceleration of oxide breakdown and its impact on ultra-thin gate oxide reliability

    Degraeve, Robin  
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    Pangon, Nadège
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    Kaczer, Ben  
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    Nigam, Tanya
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    Groeseneken, Guido  
    ;
    Naem, Abdalla
    Proceedings paper
    1999, Symposium on VLSI Technology: Technical Digest; June 1999; Kyoto, Japan., p.59-60

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