Browsing by Author "Nannarone, Stefano"
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Publication Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists
Journal article2021, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (34) 1, p.99-103Publication Mean free path of electrons in EUV photoresist in the energy range 20 to 450 eV
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124980JPublication Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Journal article2023, ACS APPLIED MATERIALS & INTERFACES, (15) 29, p.35483-35494Publication Photoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method
Journal article2019, Journal of Photopolymer Science and Technology, (32) 1, p.57-66Publication Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)
Oral presentation2022, CECAMPublication The hidden energy tail of low energy electrons in EUV lithography
Proceedings paper2019, Advances in Patterning Materials and Processes XXXVI, 24/02/2019, p.1096009