Browsing by Author "Nannarone, Stefano"
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Publication Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists
Journal article2021, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (34) 1, p.99-103Publication Mean free path of electrons in EUV photoresist in the energy range 20 to 450 eV
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124980JPublication Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Journal article2023, ACS APPLIED MATERIALS & INTERFACES, (15) 29, p.35483-35494Publication Photoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method
Journal article2019, Journal of Photopolymer Science and Technology, (32) 1, p.57-66Publication Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)
Oral presentation2022-03-17, CECAMPublication The hidden energy tail of low energy electrons in EUV lithography
Proceedings paper2019, Advances in Patterning Materials and Processes XXXVI, 24/02/2019, p.1096009