Browsing by Author "Nouri, F."
Now showing 1 - 6 of 6
- Results Per Page
- Sort Options
Publication Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS
;Kraus, P.A. ;Chua, T.C. ;Ahmed, K.Z. ;Campbell, J. ;Nouri, F. ;Cruise, J.Rothschild, AudeJournal article2004, Semiconductor Fabtech, 23, p.73-76Publication High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric
;Wang, X.P. ;Li, M.F. ;Yu, HongYu ;Yang, J.J. ;Loh, W.Y. ;Zhu, C.X. ;Du, A.Y. ;Trigg, A.D.Zhang, G.Proceedings paper2007, International Conference on Solid State Devices and Materials - SSDM, 18/09/2006Publication Leakage current control in recessed SiGe source/drain junctions
Journal article2007, Journal of the Electrochemical Society, (154) 9, p.H814-H821Publication Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
Proceedings paper2007, Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM, 18/09/2007, p.712-713Publication Study of Ni-Silicide contacts to Si:C source/drain
Journal article2007, Semiconductor Fabtech, 34, p.92-98Publication Study of pulsed RF DPN process parameters for 65 nm node MOSFET gate dielectrics
Proceedings paper2004, Integration of Advanced Micro- and Nanoelectronic Devices - Critical Issues and Solutions, 10/04/2004, p.49-53