Browsing by Author "O'Neill, A.G."
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Publication 1/f noise study on strained Si0.8Ge0.2 p-channel MOSFETs with high-k/poly Si gate stack
Journal article2009, Solid-State Electronics, (53) 11, p.1177-1182Publication Application of a nano-mechanical sensor to monitor stress in copper damascene interconnects
Journal article2009, Applied Physics Express, (2) 9, p.96503Publication In-situ growth of Cu-Mn alloy self-forming barriers in 100 nm Cu/Low-k damascene interconnects
; ; ; ; ; Oral presentation2009, 18th Workshop Materials for Advanced Metallization - MAMPublication Quantifying self-heating effects with scaling in globally strained Si MOSFETS
Journal article2007, Solid-State Electronics, (51) 11_12, p.1473-1478Publication Strained Si/SiGe MOS technology
;Olsen, S. ;Yan, L. ;Agaiby, R. ;Escobedo-Cousin, E. ;O'Neill, A.G. ;Hellstrom, P.-E.Ostling, M.Oral presentation2007, 4th International Symposium on Advanced Gate Stack technologyPublication Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects
Journal article2009, Journal of Applied Physics, (106) 5, p.53524Publication Thermal stability of supercritical thickness-strained Si layers on thin strain-relaxed buffers
;Escobedo-Cousin, E. ;Olsen, S.H. ;Dobrosz, P. ;Bull, S.J. ;O'Neill, A.G. ;Coulson, H.Claeys, CorJournal article2007, Journal of Applied Physics, (102) 12, p.123502