Browsing by Author "Oikawa, Noriaki"
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Publication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication Enabling 3-level High Aspect Ratio Supervias for 3nm nodes and below
Proceedings paper2022-06-29, IITC2022, 2022-06-27Publication High Aspect Ratio Supervia Dual Damascene etch for iN5 and beyond
Meeting abstract2021, AVS 67th International Symposium and Exhibition, 24/10/2021Publication Impact of local variability on defect-aware process windows
Proceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570H