Browsing by Author "Okada, Soichiro"

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Approaches to Enable Patterning of Tight Pitches towards High NA EUV

Tadatomo, Hiroki
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Dauendorffer, Arnaud
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Onitsuka, Tomoya
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Genjima, Hisashi
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Ido, Yasuyuki
Proceedings paper
2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.120560F
Co-optimization of lithographic and patterning processes for improved EPE performance

Maslow, Mark
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Timoshkov, Vadim
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Kiers, Ton
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Jee, Tae Kwon
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de Loijer, Peter
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Morikita, Shinya
Proceedings paper
2017, Advanced Etch Technology for Nanopatterning VI, 27/02/2017, p.101490N
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing

Dinh, Cong Que
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Nagahara, Seiji
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Kuwahara, Yuhei
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Dauendorffer, Arnaud
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Yoshida, Keisuke
Journal article
2022, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (35) 1, p.87-93
Recent advances in EUV patterning in preparation towards high-NA EUV

Nagahara, Seiji
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Dauendorffer, Arnaud
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Thiam, Arame
;
Liu, Xiang
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Kuwahara, Yuhei
;
Dinh, Cong Que
Proceedings paper
2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981G