Browsing by Author "Pellens, Nick"
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Publication High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers
Proceedings paper2024, 39th European Mask and Lithography Conference (EMLC), JUN 17-19, 2024, p.Art. 132731MPublication Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization
Proceedings paper2024, 2024 International Conference on Extreme Ultraviolet Lithography, SEP 30-OCT 03, 2024, p.Art. 1321505Publication Mask innovations on the eve of high NA EUV lithography
Journal article review2024, JAPANESE JOURNAL OF APPLIED PHYSICS, (63) 4, p.Art. 040804Publication Probing the role of substrate chemistry and interface interactions on MoS2
Meeting abstract2018, IEEE Semiconductor Interface Specialists Conference - SISC, 6/12/2018Publication Stitching for High NA: zooming in on CDU budget
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275002Publication Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study
Journal article2025-JAN 1, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (24) 1