Repository logo Institutional repository
  • Communities & Collections
  • Scientific publicationsOpen knowledge
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Polli, Marco"

Filter results by typing the first few letters
Now showing 1 - 7 of 7
  • Results per page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

    Pathangi Sriraman, Hari
    ;
    Chan, BT  
    ;
    Bayana, Hareen  
    ;
    Vandenbroeck, Nadia  
    ;
    Van Den Heuvel, Dieter  
    Journal article
    2015, Journal of Micro/Nanolithography MEMS and MOEMS, (14) 3, p.31204
  • Loading...
    Thumbnail Image
    Publication

    Evaluation of post ion-implantation resist strip with the background signal of a light scattering tool

    Halder, Sandip  
    ;
    Vos, Rita  
    ;
    Wada, Masayuki
    ;
    Tsvetanova, Diana  
    ;
    Claes, Martine  
    ;
    Mertens, Paul  
    Journal article
    2010, Japanese Journal of Applied Physics, (49) 5, p.56504
  • Loading...
    Thumbnail Image
    Publication

    GaN-on-Si process defect detection and analysis for HB-LEDs and power devices

    Halder, Sandip  
    ;
    Stiers, Karen  
    ;
    Kandaswamy, Prem Kumar
    ;
    Rosmeulen, Maarten  
    ;
    Carbonell, Laure
    Proceedings paper
    2013, 24th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 13/05/2013, p.371-374
  • Loading...
    Thumbnail Image
    Publication

    Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms

    Halder, Sandip  
    ;
    Truffert, Vincent  
    ;
    Van Den Heuvel, Dieter  
    ;
    Leray, Philippe  
    ;
    Cheng, Shaunee
    Proceedings paper
    2015, 26th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 3/05/2015, p.19-22
  • Loading...
    Thumbnail Image
    Publication

    Overlay metrology for double patterning processes

    Leray, Philippe  
    ;
    Cheng, Shaunee
    ;
    Laidler, David  
    ;
    Kandel, Daniel
    ;
    Adel, Mike
    ;
    Dinu, Berta
    Proceedings paper
    2009, Metrology, Inspection, and Process Control for Microlithography XXIII, 22/02/2009, p.72720G
  • Loading...
    Thumbnail Image
    Publication

    Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoring

    Halder, Sandip  
    ;
    Mols, Yves  
    ;
    Van Den Heuvel, Dieter  
    ;
    Van Puymbroeck, Jan  
    ;
    Caymax, Matty  
    Proceedings paper
    2014, 25th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 19/05/2014, p.283-287
  • Loading...
    Thumbnail Image
    Publication

    Using the low frequency component of the background signal for SiGe and Ge growth monitoring

    Halder, Sandip  
    ;
    Schulze, Andreas
    ;
    Leray, Philippe  
    ;
    Caymax, Matty  
    ;
    Bast, Gerhard  
    ;
    Simpson, Gavin  
    Proceedings paper
    2015, 26th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 3/05/2015

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings