Browsing by Author "Polli, Marco"
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Publication Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Journal article2015, Journal of Micro/Nanolithography MEMS and MOEMS, (14) 3, p.31204Publication Evaluation of post ion-implantation resist strip with the background signal of a light scattering tool
Journal article2010, Japanese Journal of Applied Physics, (49) 5, p.56504Publication GaN-on-Si process defect detection and analysis for HB-LEDs and power devices
Proceedings paper2013, 24th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 13/05/2013, p.371-374Publication Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms
Proceedings paper2015, 26th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 3/05/2015, p.19-22Publication Overlay metrology for double patterning processes
Proceedings paper2009, Metrology, Inspection, and Process Control for Microlithography XXIII, 22/02/2009, p.72720GPublication Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoring
Proceedings paper2014, 25th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 19/05/2014, p.283-287Publication Using the low frequency component of the background signal for SiGe and Ge growth monitoring
Proceedings paper2015, 26th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 3/05/2015