Browsing by Author "Proshina, O.V."

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1-D model of OSG low-k films modification by EUV/VUV emission

Rakhimova, T.V.
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Rakhimov, A.T.
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Mankelevich, Y.A.
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Lopaev, D.V.
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Ziryanov, S.M.
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Kovalev, A.S.
Meeting abstract
2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013
Interaction of F atoms with SiCOH ultra low-k films. Part II: Etching

Rakhimova, T.
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Lopaev, D.
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Mankelevich, Y.
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Kurchikov, K.
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Zyryanov, S.
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Palov, A.P.
Journal article
2015, Journal of Physics D: Applied Physics, (48) 17, p.175204
Recombination of O and H atoms with low-k SiOCH films pretreated in He plasma

Baklanov, Mikhaïl
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Braginsky, O.V.
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Kovalev, A.S.
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Lopaev, D.V.
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Mankelevich, Y.A.
Proceedings paper
2009, Materials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics, 14/04/2009, p.1156-D01-06
The effect of He plasma treatment on properties of organosilicate glass low-k films

Braginsky, O.V.
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Kovalev, A.S.
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Lopaev, D.V.
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Malykhin, E.M.
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Mankelevich, Y.A.
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Proshina, O.V.
Journal article
2011, Journal of Applied Physics, (109) 4, p.43303