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Browsing by Author "Reisinger, H."

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    A reliable method for the extraction of the lateral position of defects in ultra-scaled MOSFETs

    Illarionov, Yu. Yu.
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    Bina, M.
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    Tyaginov, S. E.
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    Rott, K.
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    Reisinger, H.
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    Kaczer, Ben  
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    Grasser, T.
    Proceedings paper
    2014, International Reliability Physics Symposium - IRPS, 1/06/2014, p.XT.13
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    Advanced characterization of oxide traps: the dynamic time-dependent defect spectroscopy

    Grasser, Tibor
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    Rott, K.
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    Reisinger, H.
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    Wagner, P.J.
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    Goes, W
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    Schanovsky, F.
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    Waltl, M.
    Proceedings paper
    2013, IEEE International Reliability Physics Symposium - IRPS, 14/04/2013, p.2D.2
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    Characterization and modeling of charge trapping: From single defects to devices

    Grasser, T.
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    Rzepa, G.
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    Waltl, M.
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    Goes, W.
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    Rott, K.
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    Rott, G.
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    Reisinger, H.
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    Franco, Jacopo  
    Proceedings paper
    2014, IEEE International Conference on IC Design & Technology - ICICDT, 28/05/2014, p.1-4
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    Characterization and physical modeling of the temporal evolution of near-interfacial states resulting from NBTI/PBTI stress in nMOS/pMOS transistors

    Grasser, T.
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    Stampfer, B.
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    Waltl, M.
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    Rzepa, G.
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    Rupp, K.
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    Schanovsky, F.
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    Pobegen, G.
    Proceedings paper
    2018, 2018 IEEE International Reliability Physics Symposium - IRPS, 13/03/2018, p.2A.2-1-2A.2-10
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    Hydrogen-related volatile defects as the possible cause for the recoverable component of NBTI

    Grasser, T.
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    Rott, K.
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    Reisinger, H.
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    Waltl, M.
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    Wagner, P.
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    Schanovsky, F.
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    Goes, W.
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    Pobegen, G.
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.409-412
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    Implications of gate-sided hydrogen release for post-stress degradation build-up after BTI stress

    Grasser, T.
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    Waltl, M.
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    Puschkarsky, K.
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    Stampfer, B.
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    Rzepa, G.
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    Pobegen, G.
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    Reisinger, H.
    Proceedings paper
    2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.6A-2.1-6A-2.6
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    NBTI in nanoscale MOSFETs – The ultimate modeling menchmark

    Grasser, T.
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    Rott, K.
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    Reisinger, H.
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    Waltl, M.
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    Schanovsky, F.
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    Kaczer, Ben  
    Journal article
    2014, IEEE Transactions on Electron Devices, (61) 11, p.3586-3593
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    Physical modeling of NBTI: from individual defects to devices

    Rzepa, G.
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    Goes, W.
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    Rott, G.
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    Rott, K.
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    Karner, M.
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    Kernstock, C.
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    Kaczer, Ben  
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    Reisinger, H.
    Proceedings paper
    2014, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 9/09/2014, p.81-84
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    Simultaneous extraction of recoverable and permanent components contributing to bias-temperature instability

    Grasser, T.
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    Kaczer, Ben  
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    Hehenberger, P.
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    Gös, W.
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    O'Connor, Robert
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    Reisinger, H.
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    Gustin, W.
    Proceedings paper
    2007, Technical Digest International Electron Devices Meeting - IEDM, 10/12/2007, p.801-804
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    The "permanent" component of NBTI revisited: saturation, degradation-reversal, and annealing

    Grasser, T.
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    Waltl, M.
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    Rzepa, G.
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    Goes, W.
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    Wimmer, Y.
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    El-Sayed, A.-M.
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    Shluger, A. L.
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    Reisinger, H.
    Proceedings paper
    2016, IEEE International Reliability Physics Symposium - IRPS, 17/04/2016, p.5A-2-1-5A-2-8

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