Browsing by Author "Roelandts, Nico"
Now showing 1 - 7 of 7
- Results Per Page
- Sort Options
Publication Comparative study of Ni-silicide and Co-silicide for sub 0.25 μm technologies
Oral presentation1999, European Workshop Materials for Advanced Metallization; March 8-10, 1999; Oostende, Belgium.Publication Comparative study of Ni-silicide and Co-silicide for sub 0.25-μm technologies
Journal article2000, Microelectronic Engineering, (50) 1_4, p.103-116Publication Electrical performance and scalability of Ni-monosilicide towards sub 0.13 μm technologies
Oral presentation2001, Symposium K of the MRS Spring Meeting: Gate Stack and Silicide Issues in Si Processing II; 16-20 April 2001; San Francisco, CA,Publication Optimized thermal processing for Ti-Capped CoSi2 for 0.13 μm technology
Journal article2001, Microelectronic Engineering, (55) 1_4, p.157-162Publication Optimized thermal processing for Ti-capped CoSi2 for 0.13μm technology
Oral presentation2000, Materials for Advanced Metallization Conference - MAM; February 28 - March 1, 2000; Stresa, Italy.Publication Performance and manufacturability of the Co/Ti (cap) silicidation process for 0.25μm MOS technologies
Proceedings paper1998, Proceedings of the IEEE 1998 International Interconnect Technology Conference - IITC, 1/06/1998, p.99-101Publication The influence of capping layer type on cobalt salicide formation in films and narrow lines
Proceedings paper1998, Advanced Interconnects and Contact Materials and Processes for Future Integrated Circuits, 13/04/1998, p.375-380