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Browsing by Author "Roelofs, Robin"

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    Combined PEALD gate-dielectric and in-situ SiN cap-layer for reduced Vth shift and RDS-ON dispersion of AlGaN/GaN HEMTs on 200 mm Si wafer

    Ronchi, Nicolo  
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    De Jaeger, Brice  
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    Van Hove, Marleen
    ;
    Roelofs, Robin
    ;
    Wu, Tian-Li
    ;
    Hu, Jie
    Proceedings paper
    2014, International Solid State Devices and Materials Conference - SSDM, 8/09/2014
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    Combined plasma-enhanced-atomic-layer-deposition gate dielectric and in situ SiN cap layer for reduced threshold voltage shift and dynamic ON-resistance dispersion of AlGaN

    Ronchi, Nicolo  
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    De Jaeger, Brice  
    ;
    Van Hove, Marleen
    ;
    Roelofs, Robin
    ;
    Wu, Tian-Li
    ;
    Hu, Jie
    Journal article
    2015, Japanese Journal of Applied Physics, (54) 4S, p.04DF02
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    Tailoring switching and endurance / retention reliability characteristics of HfO2 / Hf RRAM with Ti, Al, Si dopants

    Chen, Yangyin  
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    Roelofs, Robin
    ;
    Redolfi, Augusto  
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    Degraeve, Robin  
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    Crotti, Davide  
    Proceedings paper
    2014, IEEE Symposium on VLSI Technology, 9/06/2014, p.166-167
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    The impact of the gate dielectric quality in developing Au-free D-mode and E-mode recessed gate AlGaN/GaN transistors on a 200mm Si substrate

    Wu, Tian-Li
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    Marcon, Denis  
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    De Jaeger, Brice  
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    Van Hove, Marleen
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    Bakeroot, Benoit  
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    Lin, Dennis  
    Proceedings paper
    2015, IEEE 27th International Symposium on Power Semiconductor Devices and ICs - ISPSD, 10/05/2014, p.225-228
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    Time dependent dielectric breakdown (TDDB) evaluation of PE-ALD SiN gate dielectrics of AlGaN/GaN recessed gate D-mode MIS-HEMTs and E-mode MIS-FETs

    Wu, Tian-Li
    ;
    Marcon, Denis  
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    De Jaeger, Brice  
    ;
    Van Hove, Marleen
    ;
    Bakeroot, Benoit  
    ;
    Stoffels, Steve  
    Proceedings paper
    2015, IEEE International Reliability Physics Symposium - IRPS, 19/04/2015, p.6C.4

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