Browsing by Author "Roelofs, Robin"
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Publication Combined PEALD gate-dielectric and in-situ SiN cap-layer for reduced Vth shift and RDS-ON dispersion of AlGaN/GaN HEMTs on 200 mm Si wafer
Proceedings paper2014, International Solid State Devices and Materials Conference - SSDM, 8/09/2014Publication Combined plasma-enhanced-atomic-layer-deposition gate dielectric and in situ SiN cap layer for reduced threshold voltage shift and dynamic ON-resistance dispersion of AlGaN
Journal article2015, Japanese Journal of Applied Physics, (54) 4S, p.04DF02Publication Tailoring switching and endurance / retention reliability characteristics of HfO2 / Hf RRAM with Ti, Al, Si dopants
Proceedings paper2014, IEEE Symposium on VLSI Technology, 9/06/2014, p.166-167Publication The impact of the gate dielectric quality in developing Au-free D-mode and E-mode recessed gate AlGaN/GaN transistors on a 200mm Si substrate
Proceedings paper2015, IEEE 27th International Symposium on Power Semiconductor Devices and ICs - ISPSD, 10/05/2014, p.225-228Publication Time dependent dielectric breakdown (TDDB) evaluation of PE-ALD SiN gate dielectrics of AlGaN/GaN recessed gate D-mode MIS-HEMTs and E-mode MIS-FETs
;Wu, Tian-Li; ; ;Van Hove, Marleen; Proceedings paper2015, IEEE International Reliability Physics Symposium - IRPS, 19/04/2015, p.6C.4