Browsing by Author "Schmoeller, Thomas"
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Publication Application of an inverse Mack model for negative tone development simulation
Publication Calibration of physical resist models for simulation of extreme ultraviolet lithography
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13007Publication Calibration of physical resist models: methods, usability, and predictive power
Publication EUV pattern shift compensation strategies
Proceedings paper2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69211BPublication Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Publication Fullfield 27nm CD control and modeling
; ; ; ; ; Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication Impact of mask three dimensional effects on resist-model calibration
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3 Letters), (8) 3, p.30501Publication Patterning process exploration of metal 1 layer in 7nm node with 3D pattering flow simulations
Proceedings paper2015, Optical Microlithographies XXVIII, 22/02/2015, p.942609