Browsing by Author "Schwalke, U."
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Publication Characterization of the Vt-instability un SiO2 HFO2 gate dielectrics
Proceedings paper2003, Proceedings 41st Annual IEEE International Reliability Physics Symposium, 30/03/2003, p.41-45Publication Charge trapping and dielectric reliability of SiO2/AI2O3 gate stacks with TiN electrodes
Journal article2003, IEEE Trans. Electron Devices, (50) 5, p.1261-1269Publication Charge trapping in SiO2/HfO2 gate dielctrics: comparison between charge-pumping and pulsed I-D-V-G
Journal article2004, Microelectronic Engineering, (72) 1_4, p.267-272Publication Charging instability in n-channel MOSFETs with SiO2/HfO2 gate dielectrics
Oral presentation2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISCPublication Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectrics
Journal article2003, IEEE Electron Device Letters, (24) 2, p.87-89Publication Stress induced charge trapping effects in SiO2/Al2O3 gate stacks with TiN electrodes
Journal article2003, Journal of Applied Physics, (94) 10, p.6627-6630