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Browsing by Author "Sijmus, Bram"

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    AlGaN/GaN HEMT grown on 150 mm Silicon(111) Substrates

    Cheng, Kai
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    Leys, Maarten
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    Degroote, Stefan
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    Derluyn, Joff
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    Sijmus, Bram
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    Favia, Paola  
    Proceedings paper
    2007, 12th European Workshop on Metalorganic Vapour Phase Epitaxy - EWMOVPE XII, 3/06/2007
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    AlGaN/GaN high electron mobility transistors grown on 150mm Si(111) substrates with high uniformity

    Cheng, Kai
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    Leys, Maarten
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    Degroote, Stefan
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    Derluyn, Joff
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    Sijmus, Bram
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    Favia, Paola  
    Journal article
    2008, Japanese Journal of Applied Physics, (47) 3, p.1553-1555
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    AlN/GaN heterostructures grown by metal organic vapor phase epitaxy with in situ Si3N4 passivation

    Cheng, Kai
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    Degroote, Stefan
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    Leys, Maarten
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    Medjdoub, Farid
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    Derluyn, Joff
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    Sijmus, Bram
    Journal article
    2011, Journal of Crystal Growth, (315) 1, p.204-207
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    Characterisation and integration feasibility of JSR's low-k dielectric LKD-5109

    Das, Arabinda
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    Kokubo, Terukazu
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    Furukawa, Yukiko
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    Struyf, Herbert  
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    Vos, Ingrid  
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    Sijmus, Bram
    Journal article
    2002, Microelectronic Engineering, (64) 1_4, p.25-33
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    CMOS integration of dual work function phase controlled Ni FUSI with simultaneous integration of nMOS (NiSi) and pMOS (Ni-rich silicide) gates on HfSiON

    Lauwers, Anne  
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    Veloso, Anabela  
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    Hoffmann, Thomas Y.
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    Van Dal, Mark  
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    Vrancken, Christa  
    Proceedings paper
    2005-12, Technical Digest International Electron Devices Meeting - IEDM, 5/12/2005, p.661-664
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    Copper CMP using a Lam teres linear planarization technology

    Vos, I.
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    Meuris, Marc  
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    Sijmus, Bram
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    Stella, Mario
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    Delaney, N.
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    Gobbin, Korneel
    Oral presentation
    2001, 6th International Chemical-Mechanical Polish (C.M.P.) Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC) and
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    Diffusion-less junctions and super halo profiles for PMOS transistors formed by SPER and FUSI gate in 45 nm physical gate length devices

    Severi, Simone  
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    Kottantharayil, Anil
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    Pawlak, Bartek  
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    Duffy, Ray
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    Henson, K.
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    Lindsay, R.
    Proceedings paper
    2004, Technical Digest International Electron Devices Meeting - IEDM, 13/12/2004, p.99-102
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    Epitaxial growth of III-nitrides on silicon substrates

    Degroote, Stefan
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    Leys, Maarten
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    Cheng, Kai
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    Sijmus, Bram
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    Derluyn, Joff
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    Borghs, Gustaaf  
    Proceedings paper
    2010, SiGe, Ge, and Related Compounds 4: Materials, Processing and Devices, 10/10/2010, p.833-842
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    Epitaxial lateral overgrowth of GaN on 4 inch Si(111) by MOVPE

    Cheng, Kai
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    Motsnyi, Vasyl  
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    Leys, Maarten
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    Degroote, Stefan
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    Sijmus, Bram
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    Germain, Marianne
    Proceedings paper
    2007, 7th International Conference on Nitride Semiconductors - ICNS-7, 16/09/2007
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    Epitaxial lateral overgrowth of GaN on 4 inch Si(111) by MOVPE

    Cheng, Kai
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    Motsnyi, Vasyl  
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    Leys, Maarten
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    Degroote, Stefan
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    Sijmus, Bram
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    Germain, Marianne
    Journal article
    2008, Physica Status Solidi C, (5) 6, p.1624-1626
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    GaN-on-Si for high-voltage applications

    Visalli, Domenica
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    Van Hove, Marleen
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    Srivastava, Puneet
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    Marcon, Denis  
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    Geens, Karen  
    Meeting abstract
    2011, 220th Electrochemical Society Fall Meeting Symposium E: GaN and SiC Power Technologies, 9/10/2011, p.2173
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    GaN-on-Si for high-voltage applications

    Visalli, Domenica
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    Van Hove, Marleen
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    Srivastava, Puneet
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    Marcon, Denis  
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    Geens, Karen  
    Proceedings paper
    2011, Gallium Nitride and Silicon Carbide Power Technologies, 9/10/2011, p.101-112
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    GaN-on-Si for power conversion

    Germain, Marianne
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    Derluyn, Joff
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    Van Hove, Marleen
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    Medjdoub, Farid
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    Das, Jo
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    Marcon, Denis  
    Proceedings paper
    2010, The International Conference on Compound Semiconductor Manufacturing Technology - CSMANTECH, 17/05/2010, p.225-228
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    GaN-on-Si power field effect transistors

    Germain, Marianne
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    Derluyn, Joff
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    Van Hove, Marleen
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    Medjdoub, Farid
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    Das, Jo
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    Cheng, Kai
    Proceedings paper
    2010, International Symposium on VLSI Technology Systems and Applications - VLSI-TSA, 26/04/2010, p.171-172
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    Growth and optimization of InGaN/InGaN multiple quantum wells by metal organic vapour phase epitaxy

    Liang, Hu  
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    Cheng, Kai
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    Zhang, Liyang
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    Leys, Maarten
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    Sijmus, Bram
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    L'abbe, Caroline
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    Dekoster, Johan  
    Oral presentation
    2011, MRS Fall Meeting Symposium O: Compound Semiconductors for Generating, Emitting, and Manipulating Energy
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    High quality GaN based structures grown on large size Si(111) substrates using interlayers by MOVPE

    Cheng, Kai
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    Leys, Maarten
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    Degroote, Stefan
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    Derluyn, Joff
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    Sijmus, Bram
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    Favia, Paola  
    Oral presentation
    2007, E-MRS Spring Meeting Symposium F: Novel Gain Materials and Devices Based on III-N-V Compounds
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    Highly reliable and extremely stable SiGe micro-mirrors

    Gromova, Maria
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    Haspeslagh, Luc  
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    Verbist, Agnes
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    Du Bois, Bert  
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    Van Hoof, Rita  
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    Eyckens, Brenda
    Proceedings paper
    2007-01, Technical Digest 20th IEEE International Micro Electro Mechanical Systems Conference - MEMS, 21/01/2007, p.759-762
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    Impact of LKD5109 low-k to cap/liner interfaces in single damascene process and performance

    Iacopi, Francesca
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    Patz, Michael
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    Vos, Ingrid  
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    Tokei, Zsolt  
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    Sijmus, Bram
    ;
    Le, Quoc Toan  
    Journal article
    2003, Microelectronic Engineering, (70) 2_4, p.293-301
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    Influence of growth temperature on buffer leakage current of AlGaN/GaN/AlGaN DH-FET grown on silicon substrates

    Cheng, Kai
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    Srivastava, Puneet
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    Sijmus, Bram
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    Dekoster, Johan  
    Oral presentation
    2011, 9th International Conference on Nitride Semiconductors - ICNS-9
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    Integration feasibility of porous SiLK semiconductor dielectric

    Waeterloos, Joost
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    Struyf, Herbert  
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    Van Aelst, Joke  
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    Castillo, D. W.
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    Lucero, S.
    ;
    Caluwaerts, Rudy  
    Proceedings paper
    2001, Proceedings of the IEEE 2001 International Interconnect Technology Conference, 4/06/2001, p.253-254
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