Browsing by Author "Smith, Bruce W."
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Publication EUV resist requirements: absorbance and acid yield
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727332Publication Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 4, p.43001Publication Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography
Journal article2013, Applied Optics, (52) 3, p.314-322Publication Pupil wavefront manipulation for optical nanolithography
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.832611Publication The impact of pupil plane filtering on mask roughness transfer
Journal article2013, Journal of Vacuum Science and Technology B, (31) 6, p.06F801