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Browsing by Author "Socha, Robert"

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    Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells

    Bekaert, Joost  
    ;
    Laenens, Bart
    ;
    Verhaegen, Staf
    ;
    Van Look, Lieve  
    ;
    Trivkovic, Darko  
    Journal article
    2011-03, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13008
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    Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells

    Bekaert, Joost  
    ;
    Laenens, Bart
    ;
    Verhaegen, Staf
    ;
    Van Look, Lieve  
    ;
    Trivkovic, Darko  
    Proceedings paper
    2010, Optical Microlithography XXIII, 21/02/2010, p.764008
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    Freeform illumination sources: Source mask optimization for 22 nm node SRAM

    Bekaert, Joost  
    ;
    Laenens, Bart
    ;
    Verhaegen, Staf
    ;
    Van Look, Lieve  
    ;
    Trivkovic, Darko  
    Proceedings paper
    2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009
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    Performance of FlexRay, a fully programmable illumination system for generation of freeform sources on high NA immersion systems

    Mulder, Melchior
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    Engelen, Andre
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    Noordman, Oscar
    ;
    Streutker, Gert
    ;
    van Drieenhuizen, Bert
    Proceedings paper
    2010, Optical Microlithography XXIII, 21/02/2010, p.76401P
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    Through pitch low-k1 contact hole imaging with CPL(TM) technology

    Wiaux, Vincent  
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    Bekaert, Joost  
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    Ronse, Kurt  
    ;
    Vandenberghe, Geert  
    ;
    Fung Chen, J.
    ;
    Hsu, Stephen
    Journal article
    2004, Photomask, BACUS News, (20) 12, p.1-11
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    Through pitch low-k1 contact hole imaging with CPLTM technology

    Wiaux, Vincent  
    ;
    Bekaert, Joost  
    ;
    Fung Chen, J.
    ;
    Hsu, Stephen
    ;
    Ronse, Kurt  
    ;
    Socha, Robert
    Proceedings paper
    2004, Photomask and Next-Generation Lithography Mask Technology XI, 14/04/2004, p.585-594

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