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Browsing by Author "Stolk, Peter"

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    Advanced PMOS device architecture for highly-doped ultra-shallow junctions

    Surdeanu, Radu
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    Pawlak, Bartek  
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    Lindsay, Richard
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    Van Dal, Mark  
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    Doornbos, Gerben  
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    Dachs, C.J.J.
    Journal article
    2004, Japanese J. of Appl. Phys. Part 1, (43) 4B, p.1778-1783
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    CMOS device optimisation for mixed-signal technologies

    Stolk, Peter
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    Tuinhout, Hans
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    Duffy, Ray
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    Augendre, Emmanuel
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    Bellefroid, L. P.
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    Bolt, M. J. B.
    Proceedings paper
    2001, IEDM Technical Digest, 2/12/2001, p.215-218
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    Gate dielectrics for high performance and low power CMOS SoC applications

    Cubaynes, Florence
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    Dachs, Charles
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    Detcheverry, Celine
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    Zegers, A.
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    Venezia, Vincent
    Proceedings paper
    2002, ESSDERC - 32nd European Solid-State Device Research Conference, 24/09/2002, p.427-430
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    Laser annealing for ultra-shallow junction formation in advanced CMOS

    Surdeanu, Radu
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    Ponomarev, Youri
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    Cerutti, R.
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    Pawlak, Bartek  
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    Nanver, L.K.
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    Hoflijk, Ilse  
    Proceedings paper
    2002, Rapid Thermal And Other Short-Time Processing Technologies III, 12/05/2002, p.413-426
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    Leakage optimization of ultra-shallow junctions formed by solid phase epitaxial regrowth

    Lindsay, Richard
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    Henson, Kirklen
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    Vandervorst, Wilfried  
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    Maex, Karen  
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    Pawlak, Bartek  
    Journal article
    2004, Journal of Vacuum Science and Technology B, (22) 1, p.306-311
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    Optimization of junctions formed by solid phase epitaxial regrowth for sub-70nm CMOS

    Lindsay, Richard
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    Pawlak, Bartek  
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    Stolk, Peter
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    Maex, Karen  
    Proceedings paper
    2002, Silicon Front-End Junction Formation Technologies, 1/04/2002, p.C2.1
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    Optimizing p-type ultra-shallow junctions for the 65 nm CMOS technology node

    Pawlak, Bartek  
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    Lindsay, Richard
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    Surdeanu, Radu
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    Stolk, Peter
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    Maex, Karen  
    Proceedings paper
    2002, Proceedings of the 14th International Conference on Ion Implantation Technology, 22/09/2002, p.21-14
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    Pre-amorphization and co-implantation suitability for advanced PMOS devices integration

    Surdeanu, Radu
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    Pawlak, Bartek  
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    Lindsay, Richard
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    Van Dal, Mark  
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    Doornbos, Gerben  
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    Dachs, Charles
    Proceedings paper
    2003, Extended Abstracts of the 2003 International Conference on Solid State Device and Materials, 16/09/2003, p.740-741
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    Shallow junctions for sub-100 nm CMOS technology

    Meyssen, Veerle
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    Stolk, Peter
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    van Zijl, Jeroen
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    van Berkum, Jurgen
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    van de Wijgert, Willem
    Proceedings paper
    2001, Si Front-End Processing - Physics and Technology of Dopant-Defect Interactions III, 17/04/2001, p.J.3.5.1-J3.5.6
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    Transient enhanced diffusion of Boron in Si

    Jain, Suresh
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    Schoenmaker, Wim
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    Lindsay, Richard
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    Stolk, Peter
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    Decoutere, Stefaan  
    Journal article
    2002, Journal of Applied Physics, (91) 11, p.8919-8941
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    Ultrashallow junctions for advanced CMOS technology

    Stolk, Peter
    ;
    Meyssen, Veerle
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    Lindsay, Richard
    ;
    Dachs, Charles
    ;
    Mannino, Giovanni
    ;
    Cowern, Nick
    Proceedings paper
    2001, Proceedings SEMI Front End Technology Conference, 24/04/2001

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