Browsing by Author "Stolk, Peter"
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Publication Advanced PMOS device architecture for highly-doped ultra-shallow junctions
Journal article2004, Japanese J. of Appl. Phys. Part 1, (43) 4B, p.1778-1783Publication CMOS device optimisation for mixed-signal technologies
;Stolk, Peter ;Tuinhout, Hans ;Duffy, Ray ;Augendre, Emmanuel ;Bellefroid, L. P.Bolt, M. J. B.Proceedings paper2001, IEDM Technical Digest, 2/12/2001, p.215-218Publication Gate dielectrics for high performance and low power CMOS SoC applications
;Cubaynes, Florence ;Dachs, Charles ;Detcheverry, Celine ;Zegers, A.Venezia, VincentProceedings paper2002, ESSDERC - 32nd European Solid-State Device Research Conference, 24/09/2002, p.427-430Publication Laser annealing for ultra-shallow junction formation in advanced CMOS
Proceedings paper2002, Rapid Thermal And Other Short-Time Processing Technologies III, 12/05/2002, p.413-426Publication Leakage optimization of ultra-shallow junctions formed by solid phase epitaxial regrowth
Journal article2004, Journal of Vacuum Science and Technology B, (22) 1, p.306-311Publication Optimization of junctions formed by solid phase epitaxial regrowth for sub-70nm CMOS
Proceedings paper2002, Silicon Front-End Junction Formation Technologies, 1/04/2002, p.C2.1Publication Optimizing p-type ultra-shallow junctions for the 65 nm CMOS technology node
Proceedings paper2002, Proceedings of the 14th International Conference on Ion Implantation Technology, 22/09/2002, p.21-14Publication Pre-amorphization and co-implantation suitability for advanced PMOS devices integration
;Surdeanu, Radu; ;Lindsay, Richard; ; Dachs, CharlesProceedings paper2003, Extended Abstracts of the 2003 International Conference on Solid State Device and Materials, 16/09/2003, p.740-741Publication Shallow junctions for sub-100 nm CMOS technology
;Meyssen, Veerle ;Stolk, Peter ;van Zijl, Jeroen ;van Berkum, Jurgenvan de Wijgert, WillemProceedings paper2001, Si Front-End Processing - Physics and Technology of Dopant-Defect Interactions III, 17/04/2001, p.J.3.5.1-J3.5.6Publication Transient enhanced diffusion of Boron in Si
Journal article2002, Journal of Applied Physics, (91) 11, p.8919-8941Publication Ultrashallow junctions for advanced CMOS technology
;Stolk, Peter ;Meyssen, Veerle ;Lindsay, Richard ;Dachs, Charles ;Mannino, GiovanniCowern, NickProceedings paper2001, Proceedings SEMI Front End Technology Conference, 24/04/2001