Browsing by Author "Sugihara, Takashi"
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Publication Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes
Journal article1998, Journal of Vacuum Science and Technology B, (12) 6, p.3322-3333Publication Lithographic performance of 193 nm resist
Proceedings paper1998, 193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book, 14/09/1998, p.P-020Publication Lithographic performance of 193 nm single and bi-layer materials
Journal article1998, Journal of Photopolymer Science and Technology, (11) 3, p.513-23Publication Resist surface investigations for reduction of line-edge-roughness in surface imaging technology
Oral presentation1998, MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.Publication Resist surface investigations for reduction of line-edge-roughness in top surface imaging technology
Journal article1999, Microelectronic Engineering, (46) 1_4, p.339-343