Browsing by Author "Tillack, Bernd"
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Publication Atomically controlled processing for dopant segregation in CVD Si and Ge epitaxial growth
Meeting abstract2017-05, ULSIC vs TFT: 6th International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film T, 21/05/2017Publication Atomically controlled processing for dopant segregation in CVD Si and Ge epitaxial growth
Proceedings paper2017-05, ULSIC vs TFT: 6th Int Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors, 21/05/2017, p.33-42Publication Atomically controlled processing for dopant segregation in CVD Si and Ge epitaxial growth
Journal article2018-05, ECS Journal of Solid State Science and Technology, (7) 6, p.P305-P310Publication Atomically controlled processing for Ge CVD epitaxial growth
Proceedings paper2016, IEEE 13th International Conference on Solid-State and Integrated-Circuit Technology - ICSICT, 25/10/2016, p.317-320Publication Atomically controlled processing for in-situ doping in CVD Si and Ge epitaxial growth
Meeting abstract2017-07, 1st International Semiconductor Conference for Global Challenges - ISCGC, 16/07/2017Publication Atomically controlled processing for Si and Ge CVD epitaxial growth
Meeting abstract2016, 229th ECS Meeting: Symposium D01: Dielectrics for Nanosystems 7: Materials Science, Processing, Reliability, and Manufacturing, 29/05/2016, p.988Publication Atomically controlled processing for Si and Ge CVD epitaxial growth
Proceedings paper2016, Dielectrics for Nanosystems 7: Materials Science, Processing, Reliability, and Manufacturing, 29/05/2016, p.71-82Publication Dopant segregation and diffusion in CVD epitaxial Grown Ge
;Murota, Junichi ;Yamamoto, Yuchi ;Costina, Ioan ;Baerwolf, FlorianTillack, BerndMeeting abstract2017, 6th International Workshop on Nanotechnology and Application - IWNA, 8/11/2017Publication Dopant segregation and diffusion in CVD epitaxial grown germanium
;Murota, Junichi ;Yamamoto, Yuchi ;Costina, Ioan ;Baerwolf, FlorianTillack, BerndProceedings paper2017-11, Proceedings of the 6th International Workshop on Nanotechnology and Application - IWNA, 8/11/2017, p.37-41Publication Dopant segregation in Si and Ge CVD epitaxial growth
Meeting abstract2016-11, 8th International Workshop on Advanced Materials Science and Nanotechnology - IWAMSN, 8/11/2016, p.33-34Publication Dopant segregation in Si and Ge CVD epitaxial growth
Meeting abstract2016, JSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration", 24/11/2016, p.7-8Publication EI4GroupIV: Excellence initiative for new group IV semiconductor materials & processing
Oral presentation2016, INC Global Nanotechnology ConferencePublication EI4GroupIV: Excellence Initiative for New Group IV semiconductor materials & processing
Meeting abstract2016, JSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration", 24/11/2016, p.58-59Publication Photoluminescence of phosphorus atomic layer doped Ge grown on Si
;Yamamoto, Yuji ;Nien, Li-Wei ;Capellini, Giovanni ;Virgilio, MicheleCostina, IoanJournal article2017, Semiconductor Science and Technology, (32) 10, p.104005Publication Thin and locally dislocation-free SiGe virtual substrate fabrication by lateral selective growth
;Yamamoto, Yuji ;Wen, Wei-Chen ;Schubert, Markus AndreasCorley-Wiciak, Agnieszka AnnaJournal article2024, JAPANESE JOURNAL OF APPLIED PHYSICS, (63) 2, p.Art. 02SP53