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Browsing by Author "Tillack, Bernd"

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    Atomically controlled processing for dopant segregation in CVD Si and Ge epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Meeting abstract
    2017-05, ULSIC vs TFT: 6th International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film T, 21/05/2017
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    Atomically controlled processing for dopant segregation in CVD Si and Ge epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Proceedings paper
    2017-05, ULSIC vs TFT: 6th Int Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors, 21/05/2017, p.33-42
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    Atomically controlled processing for dopant segregation in CVD Si and Ge epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Journal article
    2018-05, ECS Journal of Solid State Science and Technology, (7) 6, p.P305-P310
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    Atomically controlled processing for Ge CVD epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Proceedings paper
    2016, IEEE 13th International Conference on Solid-State and Integrated-Circuit Technology - ICSICT, 25/10/2016, p.317-320
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    Atomically controlled processing for in-situ doping in CVD Si and Ge epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Meeting abstract
    2017-07, 1st International Semiconductor Conference for Global Challenges - ISCGC, 16/07/2017
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    Atomically controlled processing for Si and Ge CVD epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, I.
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Meeting abstract
    2016, 229th ECS Meeting: Symposium D01: Dielectrics for Nanosystems 7: Materials Science, Processing, Reliability, and Manufacturing, 29/05/2016, p.988
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    Atomically controlled processing for Si and Ge CVD epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Proceedings paper
    2016, Dielectrics for Nanosystems 7: Materials Science, Processing, Reliability, and Manufacturing, 29/05/2016, p.71-82
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    Dopant segregation and diffusion in CVD epitaxial Grown Ge

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Baerwolf, Florian
    ;
    Tillack, Bernd
    Meeting abstract
    2017, 6th International Workshop on Nanotechnology and Application - IWNA, 8/11/2017
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    Dopant segregation and diffusion in CVD epitaxial grown germanium

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Baerwolf, Florian
    ;
    Tillack, Bernd
    Proceedings paper
    2017-11, Proceedings of the 6th International Workshop on Nanotechnology and Application - IWNA, 8/11/2017, p.37-41
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    Dopant segregation in Si and Ge CVD epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Meeting abstract
    2016-11, 8th International Workshop on Advanced Materials Science and Nanotechnology - IWAMSN, 8/11/2016, p.33-34
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    Dopant segregation in Si and Ge CVD epitaxial growth

    Murota, Junichi
    ;
    Yamamoto, Yuchi
    ;
    Costina, Ioan
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Loo, Roger  
    Meeting abstract
    2016, JSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration", 24/11/2016, p.7-8
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    EI4GroupIV: Excellence initiative for new group IV semiconductor materials & processing

    Murota, Junichi
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    Loo, Roger  
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    Tillack, Bernd
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    Le Thanh, Vin
    ;
    Chiussi, Stefano
    ;
    Hirayama, Makoto
    Oral presentation
    2016, INC Global Nanotechnology Conference
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    EI4GroupIV: Excellence Initiative for New Group IV semiconductor materials & processing

    Murota, Junichi
    ;
    Loo, Roger  
    ;
    Tillack, Bernd
    ;
    Le Thanh, Vin
    ;
    Chiussi, Stefano
    ;
    Hirayama, Makoto
    Meeting abstract
    2016, JSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration", 24/11/2016, p.58-59
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    Photoluminescence of phosphorus atomic layer doped Ge grown on Si

    Yamamoto, Yuji
    ;
    Nien, Li-Wei
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    Capellini, Giovanni
    ;
    Virgilio, Michele
    ;
    Costina, Ioan
    Journal article
    2017, Semiconductor Science and Technology, (32) 10, p.104005
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    Thin and locally dislocation-free SiGe virtual substrate fabrication by lateral selective growth

    Yamamoto, Yuji
    ;
    Wen, Wei-Chen
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    Schubert, Markus Andreas
    ;
    Corley-Wiciak, Agnieszka Anna
    Journal article
    2024, JAPANESE JOURNAL OF APPLIED PHYSICS, (63) 2, p.Art. 02SP53

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