Browsing by Author "Van Puyenbroeck, Ilse"
Now showing 1 - 5 of 5
- Results Per Page
- Sort Options
Publication Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Proceedings paper1998, Optical Microlithography XI, 25/02/1998, p.322-336Publication How to use DUV BARCs on topography
Journal article1998, Microlithography World, Summer Issue, p.13Publication Optimisation of bottom-ARC processes with respect to CD control
Journal article1998, Future Fab International, 5, p.205-210Publication Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Oral presentation1998, MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.Publication Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Journal article1999, Microelectronic Engineering, (46) 1_4, p.353-357