Browsing by Author "Waldfried, Carlo"
Now showing 1 - 9 of 9
- Results per page
- Sort Options
Publication Effects of UV-cure on mechanical, physical and electrical properties of microporous SiOC:H dielectric films
Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
Meeting abstract2008, Advanced Metallization Conference - AMC, 23/09/2008Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
Publication Non-oxidizing solvent-based strip of ion implanted photoresist
Meeting abstract2010, 10th International Symposium on Ultra-Clean Processing of Semiconductor Surfaces, 20/09/2010Publication Non-oxidizing solvent-based strip of ion implanted photoresist
Journal article2012, Solid State Phenomena, 187, p.97-100Publication Post extension ion implant photo resist strip for 32 nm technology and beyond
Oral presentation2008, 9th International Symposium on Utra Clean Processing of Semiconductor Surfaces - UCPSSPublication Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent
Journal article2011, Journal of the Electrochemical Society, (158) 2, p.H150-H155Publication Thermo-mechanical properties of thin organosilicate glass films treated by ultra-violet-assisted cure
Journal article2007-02, Acta Materialia, (55) 4, p.1407-1414Publication UV-assisted curing: an effective technique for toughening of low-k organosilicate films