Browsing by Author "Weeks, Doran"
Now showing 1 - 7 of 7
- Results Per Page
- Sort Options
Publication High efficiency low temperature pre-epi clean method for advanced group IV epi processing
Proceedings paper2012, SiGe, Ge, and Related Compunds 5: Materials, Processing, and Devices, 7/10/2012, p.339-348Publication High efficiency low temperature pre-epi clean method for advanced group IV epi processing
Meeting abstract2012-09, 222nd ECS Meeting, Pacific RIM Meeting on Electrochemical and Solid-State Science, 7/10/2012, p.3137Publication Low-temperature pre-epitaxy surface cleaning of Si and SiGe
Meeting abstract2015-05, 9th International Conference on Silicon Epitaxy and Heterostructures - ICSI9, 17/05/2015, p.143-144Publication Orientation dependence of Si1-xCx:P growth and the impact on FinFET structues
Meeting abstract2012, 222nd ECS Meeting, Pacific RIM Meeting on Electrochemical and Solid-State Science, 7/10/2012, p.3160Publication Orientation dependence of Si1-xCx:P growth and the impact on FiNFET structures
Proceedings paper2012-10, SiGe, Ge, and Related Compunds 5: Materials, Processing, and Devices, 7/10/2012, p.491-497Publication SiCP selective epitaxial growth in recessed source/drain regions yielding to drive current enhancement in n-channel MOSFET
Proceedings paper2008, SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices, 12/10/2008, p.1001-1013Publication Strain enhanced NMOS using in situ doped embedded Si1-xCx S/D stressors with up to 1.5% substitutional carbon content grown using a novel deposition process
Journal article2008-06, IEEE Electron Device Letters, (29) 11, p.1206-1208