Browsing by Author "Wei, Chih-, I"
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Publication Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 041603Publication Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
Journal article review2022, JAPANESE JOURNAL OF APPLIED PHYSICS, (61) SD, p.SD0806Publication Calibration of Gaussian Random Field stochastic EUV models
Proceedings paper2022, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.1205105Publication E-beam metrology-based EUVL aberration monitoring
Publication EUV based multi-patterning schemes for advanced DRAM nodes
Proceedings paper2022, Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2022, p.Art. 1205503Publication High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers
Proceedings paper2024, 39th European Mask and Lithography Conference (EMLC), JUN 17-19, 2024, p.Art. 132731MPublication Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
; ; ; Kim, Ryan Ryoung hanProceedings paper2022, International Conference on Extreme Ultraviolet Lithography, SEP 26-29, 2022, p.Art. 122920W