Browsing by Author "Welling, Ulrich"
- Results per page
- Sort Options
Publication High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print
Proceedings paper2025, Photomask Technology, 2025-09-22, p.1368713Publication High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation
Publication Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 044801Publication Power spectral density as template for modeling a metal-oxide nanocluster resist to obtain accurate resist roughness profiles
Journal article2021, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (20) 2, p.024601Publication Prediction of EUV stochastic microbridge probabilities by lithography simulations
Proceedings paper2020, Extreme Ultraviolet (EUV) Lithography XI, 23/02/2020, p.113230KPublication Resist line edge roughness mitigation for high-NA EUVL
Proceedings paper2022, Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2022, p.120550KPublication Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
Journal article review2021, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (20) 1, p.014801Publication Tuning, Modelling, and Verifying Effects of Intermixing on EUV Multilayer Mirror Performance via a Combined Simulation and Experimental Approach
Proceedings paper2025, Photomask Technology, 2025-09-22, p.136870Z