Browsing by Author "Whittaker, Andrew K."
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Publication Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
; Jack, Kevin S.Journal article2011, Journal of Materials Chemistry, (21) 15, p.5629-5637Publication Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: towards applications as EUV photoresists
Journal article2011, Radiation Physics and Chemistry, (80) 2, p.236-241Publication Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Oral presentation2009, 11th Pacific Polymer Conference - PPC11