Browsing by Author "Wilhelm, Rudi"
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Publication Alternative gate insulator materials for future generation MOSFETs
Oral presentation2001, International Forum on Semiconductor Technology - IFST; 7-8 March 2001; Antwerpen, Belgium.Publication Critical processes for ultra-thin gate oxide integrity
; ; ; Publication Engineering of the polysilicon emitter interfacial layer using low temperature thermal re-oxidation in an LPCVD cluster tool
Proceedings paper1995, 25th European Solid State Device Research Conference - ESSDERC, 25/09/1995, p.429-432Publication High k dielectric materials prepared by atomic layer CVD
Oral presentation2001, 12th INFOS Conference - Insulating Films on Semiconductors; June 2001; Udine, Italy.Publication Sub 3 nm gate oxide growth and reliability
Oral presentation1997, Materials Research Society 1997 Spring Meeting : Symposium on Materials Reliability in Microelectronics VII; March 31 - April 3,Publication Ultra thin gate oxide technology and reliability
Proceedings paper1996, Proceedings 5th International Symposium on Semiconductor Manufacturing - ISSM, 2/10/1996, p.208-211Publication Ultra-thin gate oxides below 3 nm grown in a cluster tool
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.291-294