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Browsing by Author "Word, James"

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    3D Mask modeling for EUV lithography

    Mailfert, Julien  
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    Zuniga, Christian
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    Philipsen, Vicky  
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    Adam, Konstantinos
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    Lam, Michael
    Proceedings paper
    2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.832224
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    Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

    Ma, Yuansheng
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    Lei, Junjiang
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    Torres, J. Andres
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    Hong, Le
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    Word, James
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    Fenger, Germain
    Proceedings paper
    2015, Alternative Lithographic Technologies VII, 22/02/2015, p.942306
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    Directed self-assembly graphoepitaxy template generation with immersion lithography

    Ma, Yuansheng
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    Lei, Junjiang
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    Torres, J. Andres
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    Hong, Le
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    Word, James
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    Fenger, Germain
    Journal article
    2015, Journal of Micro/Nanolithography MEMS and MOEMS, (14) 3, p.31216
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    Experimental determination and accurate modeling of the EUV ADT flare

    Hendrickx, Eric  
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    Lorusso, Gian  
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    Fenger, Germain
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    Lam, Michael
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    Word, James
    Proceedings paper
    2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009
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    Feasibility of compensating for EUV field edge effects through OPC

    Maloney, Chris
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    Word, James
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    Fenger, Germain
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    Niroomand, Ardavan
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    Lorusso, Gian  
    ;
    Jonckheere, Rik  
    Proceedings paper
    2014, Extreme Ultraviolet (EUV) Lithography V, 23/02/2014, p.90480T
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    Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration

    Lorusso, Gian  
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    Van Roey, Frieda  
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    Hendrickx, Eric  
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    Fenger, Germain
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    Lam, Michael
    Journal article
    2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 4, p.41505
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    Model based OPC for 1st generation 193-nm lithography

    Lucas, Kevin
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    Word, James
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    Vandenberghe, Geert  
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    Verhaegen, Staf
    ;
    Jonckheere, Rik  
    Proceedings paper
    2001, Optical Microlithography XIV, 27/02/2001, p.119-130

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