Browsing by Author "Yoshida, Keisuke"

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EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing

Dinh, Cong Que
;
Nagahara, Seiji
;
Kuwahara, Yuhei
;
Dauendorffer, Arnaud
;
Yoshida, Keisuke
Journal article
2022, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (35) 1, p.87-93
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

Nagahara, S.
;
Dinh, C.Q.
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Yoshida, Keisuke
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Shiraishi, G.
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Kondo, Y.
;
Yoshihara, K.
Proceedings paper
2020, Advances in Patterning Materials and Processes XXXVII, 24/02/2020, p.113260A
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Cong Que Dinh
;
Nagahara, Seiji
;
Yoshida, Keisuke
;
Kondo, Yoshihiro
;
Muramatsu, Makoto
Proceedings paper
2021, Conference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference, FEB 22-26, 2021, p.116120L
Impact of local variability on defect-aware process windows

Maslow, Mark John
;
Yaegashi, Hidetami
;
Frommhold, Andreas
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Schiffelers, Guido
;
Wahlisch, Felix
Proceedings paper
2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570H