Browsing by Author "van Ingen Schenau, Koen"
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Publication EUV resist contrast loss determination using interference lithography
Publication Feasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC
Proceedings paper2009-09, Photomask Technology 2009, 14/09/2009, p.74882NPublication Measuring resist-induced contrast loss using EUV interference lithography
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.76362XPublication Microstepper vs. interference EUV lithography: effects on resist profiles
Proceedings paper2005, 4th International Symposium on EUV Lithography, 7/11/2005Publication Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Proceedings paper2007, Optical Microlithography XX, 27/02/2007, p.65200G