Browsing by Author "van de Kruijs, Robbert"
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Publication Advancing X-ray metrology for routine thin film analysis
Proceedings paper2018, 13th International MicroNanoConference - iMNC, 11/12/2018Publication Evaluation of optical material parameters for advanced absorbers on EUV masks
Oral presentation2016, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Mitigating EUV mask 3D effects by alternative metal absorbers
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Proceedings paper2018, Photomask Technology 2018, 17/09/2018, p.108100CPublication Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography, 24/10/2016