Browsing by author "Sugihara, Takashi"
Now showing items 1-5 of 5
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Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes
Goethals, Mieke; Van Roey, Frieda; Sugihara, Takashi; Van den hove, Luc; Vertommen, Johan; Klippert, W. (1998) -
Lithographic performance of 193 nm resist
Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Heskamp, B.; Davies, G.; Gehoel-van Ansem, W.; Paniez, P.; Temerson, T. M.; Hien, S.; Mortini, B.; Romeo, C. (1998) -
Lithographic performance of 193 nm single and bi-layer materials
Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Van Driessche, Veerle; Tzviatkov, Plamen; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R. (1998) -
Resist surface investigations for reduction of line-edge-roughness in surface imaging technology
Sugihara, Takashi; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Van den hove, Luc (1998) -
Resist surface investigations for reduction of line-edge-roughness in top surface imaging technology
Sugihara, Takashi; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Van den hove, Luc (1999)