Browsing by author "Mouraille, Orion"
Now showing items 1-14 of 14
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22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
Direct correlation between mask registration and on-wafer measurements for individual logic device features
van Haren, Richard J. F.; Steinert, Steffen; Mouraille, Orion; Kasperkiewicz, Ewa; Hermans, Jan; Hasan, Mahmudul; van Dijk, Leon; Beyer, Dirk (2022) -
Etch tool pressure optimization enabling wafer edge overlay control.
Yildirim, Oktay; van Haren, Richard; Mouraille, Orion; van Dijk, Leon; Hermans, Jan; Kumar, Kaushik; Feurprier, Yannick (2020) -
Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Hsu, Stephen; Liu, Hua Yu; Mouraille, Orion; Schreel, Koen; Dusa, Mircea; Zimmermann, Joerg; Gräupner, Paul; Neumann, Jens Timo (2011-03) -
Intra-field etch induced overlay penalties
van Haren, Richard; Yildirim, Oktay; Mouraille, Orion; van Dijk, Leon; Kumar, Kaushik; Feurprier, Yannick; Hermans, Jan (2020) -
Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; van Dijk, Leon; Otten, Ronald; Beyer, Dirk (2018) -
Mitigation of the etch-induced intra-field overlay contribution
van Haren, Richard; Yildirim, Oktay; Mouraille, Orion; van Dijk, Leon; Kumar, Kaushik; Feurprier, Yannick; Jehoul, Christiane; Hermans, Jan (2022) -
Off-line mask-to-mask registration characterization
van Haren, Richard; Steinert, Steffen; Roelofs, Christian; Mouraille, Orion; D'have, Koen; van Dijk, Leon; Beyer, Dirk (2017) -
On product overlay characterization after stressed layer etch
van Haren, Richard; Mouraille, Orion; Yildirim, Oktay; Van Dijk, Leon; Kumar, Kaushik; Feurprier, Yannick; Hermans, Jan (2021) -
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
Mouraille, Orion; van Haren, Richard; Steinert, Steffen; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
The mask contribution as part of the intra-field on-product overlay performance
Mouraille, Orion; van Haren, Richard; Steinert, Steffen; Hermans, Jan; van Dijk, Leon; Beyer, Dirk; Yildirim, Oktay (2020) -
The mask contribution as part of the intra-field on-product overlay performance
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; Hermans, Jan; van Dijk, Leon; Beyer, Dirk (2020) -
Wafer alignment mark placement accuracy impact on the layer to layer overlay performance
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019)