EISBN
978-1-5106-4988-0
ISBN
978-1-5106-4987-3
ISSN
0277-786X
Conference
Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference
Journal
Proceedings of SPIE
Volume
12056
Title
Mitigation of the etch-induced intra-field overlay contribution
Publication type
Proceedings paper